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Dual Sources Ion Implanter
The implanter has equipped with two high energy ion sources. One is a pulse-mode metal cathodic vacuum arc MEVVA source and another one is a filament discharge gas ion source for metallic and gaseous ion generation respectively. The ions can be extracted by acceleration grid upto 20kV-60kV for ion implantation.
The system possessed with broad ion beam F100mm with high ion fluent is used to perform large area implantation >F100mm to acquire high doping concentration within short processing time (10e17 atom/cm2 will be less than 1 hour). (Optional to provide broader ion beam such as F150mm or bigger for large ion implantation area of 6 inches wafer). Dependent on material and gas discharge characteristics, the implantation energy will be varied from 10keV to 120keV. The beam current will be 3mA to above 5mA for high throughput process.
The system is controlled by PLC protocol with Touch Screen Control Panel that offers friendly automatic operation. The implantation dose can be precisely controlled by dose controller and the process can be highly automated, safe and efficient.
Download "SRIM Software" This is a very good free software to calculate the ion projected range and ion distribution in the materials.
For additional product information and pricing contact our specialists at sales@plasmatechnol.com.
Related Scientific Publications
1. K. Feng, X. Cai, Z. G. Li, and P. K. Chu, "Improved Corrosion Resistance of Stainless Steel 316L by Ti Ion Implantation", Materials Letters, vol. 68, no. 1, pp. 450 - 452 (2012).
2. K. Feng, T. Hu, X. Cai, Z. G. Li, and P. K. Chu, "Ex Situ and In Situ Evaluation of Carbon Ion-Implanted Stainless Steel Bipolar Plates in Polymer Electrolyte Membrane Fuel Cells", Journal of Power Sources, vol. 199, pp. 207 - 213 (2012).
3. Y. Zhao, G. S. Wu, H. B. Pan, K. W. K. Yeung, and P. K. Chu, "Formation and Electrochemical Behavior of Al and O Plasma-Implanted Biodegradable Mg-Y-RE Alloy", Materials Chemistry and Physics, vol. 132, no. 1, pp. 187 - 191 (2012).
4. K. Feng, G. S. Wu, T. Hu, Z. G. Li, X. Cai, and P. K. Chu, "Dual Ti and C Ion-Implanted Stainless Steel Bipolar Plates in Polymer Electrolyte Membrane Fuel Cells", Surface and Coatings Technology, vol. 206, no. 11 - 12, pp. 2914-2921 (2012).
5. R. Z. Xu, G. S. Wu, X. B. Yang, X. M. Zhang, Z. W. Wu, G. Y. Sun, G. Y. Li, and P. K. Chu, "Corrosion Behavior of Chromium and Oxygen Plasma-Modified Magnesium in Sulfate Solution and Simulated Body Fluid", Applied Surface Science, vol. 258, no. 20, pp. 8273 - 8278 (2012).
6. R. Z. Xu, X. B. Yang, K. W. Suen, G. S. Wu, P. H. Li, and P. K. Chu, "Improved Corrosion Resistance on Biodegradable Magnesium by Zinc and Aluminum Ion Implantation", Applied Surface Science, vol. 263, pp. 608 - 612 (2012).
7. Y. Zhao, G. S. Wu, J. Wu, Q. Y. Lu, J. Wu, R. Z. Xu, K. W. K. Yeung, and P. K. Chu, "Improved Surface Corrosion Resistance of WE43 Magnesium Alloy by Dual Titanium and Oxygen Ion Implantation", Thin Solid Films, vol. 529, pp. 407-411 (2013).
8. Y. Zhao, J. Mohammed Ibrahim, W. K. Li, G. S. Wu, Y. F. Zheng, K. W. K. Yeung, and P. K. Chu, "Enhanced Antimicrobial Properties, Biocompatibility, and Corrosion Resistance of Plasma-Modified Biodegradable Magnesium Alloys", Acta Biomaterialia, vol. 10, no. 1, pp. 544 - 556 (2014).
9. R. Z. Xu, X. B. Yang, P. H. Li, K. W. Suen, G. S. Wu, and P. K. Chu, "Eelectrochemical Properties and Corrosion Resistance of Carbon-Ion-Implanted Magnesium", Corrosion Science, vol. 82, pp. 173 - 179 (2014).
10. W. H. Jin, G. S. Wu, H. Q. Feng, W. H. Wang, X. M. Zhang, and P. K. Chu, "Improvement of Corrosion Resistance and Biocompatibility of Rare-Earth WE43 Magnesium Alloy by Neodymium Self-Ion Implantation", Corrosion Science, vol. 94, pp. 142 - 155 (2015).
11. W. H. Jin, G. S. Wu, A. Gao, H. Q. Feng, X. Peng, and P. K. Chu, "Hafnium-Implanted WE43 Magnesium Alloy for Enhanced Corrosion Protection and Biocompatibility", Surface and Coatings Technology, vol. 306, Part A, pp. 11 -15 (2016).
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