The installation of the matching network is virtually plug-and-play with our 500W RF power generator, 1000W RF power generator and 2000W RF power generators.

Equipped with microprocessor-controlled stepper motor drives and advanced fuzzy logic tuning algorithms, the matching network rapidly transforms plasma impedances to 50 ohms to maximize power transfer to the process chamber and provides greater consistency and accuracy than traditional analog-based tuning methods. The result is optimized RF power to semiconductor, solar, FPD, and MEMs manufacturing plasma processes, including etch, PVD, PECVD, HDPCVD, ALD and chamber clean applications.

Technical Specifications

Main Technical Properties
Model	MN-20A
Frequency	13.56MHz
Maximum Transmission Power	2000W
Reflected Power (Under Maximum Positive Power Output)	< 5W
Input Impedance	50 Ohm
Automatic Matching Time	0.2 - 1 second
Auto/Manual Function	Yes
Range of the Matched Impedance	(2~45) Ohm - j(0~70) Ohm
Adjustable Capacitor	Adjustable Capacitor (1%-100%)
RF Input Connector	N / UHF type
RF Output Connector	50 Ohm, N-type or UHF-type or Copper bar Output
Cooling Mode	Air Cooling
AC Power Supply	100-240VAC
AC Frequency	50/60 Hz
Weight	~10.5kg
Size	390*260*132.5 (Length*Width*Height)mm

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Need help?

Contact an Applications Specialist by sending an Email to PTL or call 852-98814818.