PF400 Pulse Filtered Cathodic Vacuum Arc System
| Model |
: |
PF400 |
| Chamber |
: |
F 400mm x 400mm SS 304 steel ; Double-wall with water cooling, Top-opening |
| Pumping System |
: |
KYKY Turbo-molecular pump 1200L/s and rotary pump 9L/s, pneumatic gate valve, foreline valve, roughing valve and venting valve |
| Ultimate Pressure |
: |
Better than 8 x 10-5 Pa: From ATM to 2 x 10-4 Pa < 30 mins |
| Vacuum Measurement |
: |
2 Thermal gauges and 1 ion gauges with control displayer |
| Gas Feeding |
: |
2 MFCs 100SCCM with controller |
| Substrate Dimension |
: |
F150mm; Manually to change the distance from FCVA sources exit |
| Substrate Rotation |
: |
Rotation speed of 0-20RPM |
| Substrate Heating |
: |
PID temperature control from RT to 400oC +/-2oC by Quartz lamps |
| Substrate Bias |
: |
DC output (20V-100V); Pulse output (100V-1000V, 30kHz, 10%-80%) or DC superposed Pulse output |
| P-FCVA Source |
: |
2 sets of Pulse FCVA for confocal deposition
Pulse mode operation; 90o electromagnetic filter
Cathode dimension: F10mm x L30mm; Triggering voltage 12kV;
Pulse width: 200ms-3ms; Pulse frequency: 0-50Hz; Pulse Peak current: >250A |
| Interlock & Protection |
: |
Vacuum & cooling water interlock, over-current & over-voltage protection |
| Applications |
: |
Reactive deposition for nano-structured, nano-composited and multilayer of conductive, semi-conductive, insulating and opto-electrical films |
Technical Details of Pulse Filtered Cathodic Vacuum Arc Source.
Download "Ion charge state and velocity datasheet"
For additional product information and pricing contact our specialists at sales@plasmatechnol.com.
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