HIPIMS Power Supply
High Power Impulse Magnetron Sputtering
 
High Ionization Magnetron Power Supply has coupled high power pulse into DC magnetron sputtering. It delivers not only stable DC magnetron sputtering but also short high power pulse into cathode and plasma. The pulses are of >400A at voltage of 1kV with short duration and low frequency to keep low average output power down to the range of kW while the pulse peak power can be upto the range of MW.
Due to high peak power, the plasma density during the pulses is extremely high that gives very high ionization fraction compared to DC magnetron plasmas as well as it allows for fine control of the sputtered species during deposition.
| DC Sputtering |
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HIPIMS Sputtering |
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Advanced Features
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High peak power output
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High ionization fraction of upto 50%
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Effective utilization of cathode/target
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Easily adaptable to existing cathode and process
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Active arc suppression with stable sputtering process
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Adjustable pulse duration and frequency
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Good stoichiometric film in reactive deposition
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Minimum film defect by droplet - free sputtering
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Superior film density and extreme structural conformity
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Excellent adhesion and decreased roughness
 
Technical Specs
| Average Power |
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5kW, 10kW, 15kW, 20kW |
| DC Voltage |
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>700V |
| DC Current |
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5A - 30A |
| Pulse Voltage |
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200V - 1000V |
| Pulse Current |
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<=400A |
| Pulse Width |
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30us - 300us |
| Pulse Frequency |
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30Hz - 300Hz |
| Input Power |
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3-phase 380V+/-5%, 50/60Hz |
For additional product information and pricing contact our specialists at sales@plasmatechnol.com.
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