Some Main Specs:

l  F500mm x 500mm, stainless steel chamber, double-wall with water-cooling.

l  Top-lip opening by electrical motor control unit

l  1300L/s turbomolecular pump, 15L/s rotary pump, gate valve, foreline valve and roughing valve to form pumping system

l  1 set of ion gauge and 2 sets of pirani gauges with vacuum display to detect the vacuum pressure

l  The ultimate vacuum pressure can be reached below 5 x 10e-5 Pa

l  4 sets of MFC controllers with isolation valves for reactive gas feeding

l  2 sets of magnetron sputtering sources MS (2" target) with shutters and stretchable distance from sample stage.

l  2 sets of pulsed filtered cathodic metal arc sources P-FCVA for metallic plasma

l  1 sets of RF capacitance coupled plasma source RF-CCP for gaseous plasma

l  1 set of high voltage pulse modulator to conduct Plasma Immersion Ion Implantation PIII process which can be worked with RF-CCP source and P-FCVA sources

l  1 set of rotatory high-voltage HV sample stage with controllable rotation speed.

l  2 sets of rotatory low voltage LV sample stages with controllable rotation speed, stretchable distance from treatment sources, PID temperature control upto 500oC. One LV stage is face to the confocal plane of MS sources and the other one is face to the confocal plane of P-FCVA sources.