Our solid-state design 13.56MHz RF generators provide state-of-the art technology of precise and repeatable power control, ultra-stable output and low cost of ownership. Coupled with our MN-5A Matching Networks, the power system performs extraordinarily well in plasma-based thin-film manufacturing processes.

The RF plasma generators can be used as source or bias generators for continuous operation or as stand-alone batch tools, and is ideally suited for applications including, PECVD, HDPCVD, PVD, ALD, etch and strip for the manufacture of integrated circuits, solar cells, flat panel displays, LEDs, MEMs and data storage devices.

Our RF generators are protected against excessive Voltage Standing Wave Ratio (VSWR) conditions by limiting reflected power, power amplifier current, and power amplifier transistor dissipation