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  Vacuum Systems >> Magnetron Sputtering System >> MSE-350 Magnetron Sputtering System
 

MSE-350 Magnetron Sputtering System

3 Sputter Guns

   

Model : MSE-350
Chamber  :  F 350mm x 400mm SS 304 steel ; Double-wall with water cooling, Top-opening
Pumping System : KYKY Turbo-molecular pump 600L/s and rotary pump 6L/s,  pneumatic throttle valve,  foreline valve, roughing valve and venting valve
Ultmate Pressure : Better than 8 x 10-5 Pa: From ATM to 2 x 10-4 Pa < 30 mins
Vacuum Measurement : 2 Thermal gauges and 1 ion gauges with control displayer
Gas Feeding : 2 MFCs 100SCCM with controller
Substrate Holder : F 120mm; Rotation speed 0-20RPM; PID temperature control from RT to 500oC +/-2oC
Substrate Bias : DC output (20V-100V); Pulse output (100V-1000V, 30kHz, 10%-80%) or DC superposed Pulse output
Sputtering Source :

3 sets of sputter guns for confocal sputter-up deposition (2DC and 1 RF)

2-inches standard magnetron sputtering guns with pneumatic shutter;

Flexible joints for angle tilting;

Manually adjustable target to substrate distance: 80mm - 120mm;

13.56MHz, 500W RF power unit with manual matching network;

2kW DC magnetron power supply with constant current control

Interlock & Protection :  Vacuum & cooling water interlock, over-current & over-voltage protection 
Applications : Reactive deposition for nano-structured, nano-composited and multilayer of conductive, semi-conductive, insulating and opto-electrical films

                                           

For additional product information and pricing contact our specialists at sales@plasmatechnol.com.

 

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