Plasma Technology Limited
  Home    About Us    News    Products   Honors     R & D     Divisions     Feedback   Service  
User Name:
Password:
Registration  Forget Pwd?
Vacuum Systems
Power Supplies
Plasma and Ion Sources
Sputtering Targets
Online request
E-mail request
 

 
  Plasma and Ion Sources >> Gridless Gas Ion Source
 

Gridless Gas Ion Source

The ion source is ideal for a wide variety of applications such as surface precleaning to enhance film/substrate adhesion, ion beam bombardment to improve film microstructures and properties, sputtering of different target materials for deposition, assisting film growth, and so on.   

Linear ion source

Circular ion source

Applications

  • ­Reactive gas compatible
  • ­Ion beam etching, cleaning and sputtering
  • ­Ion beam assisted deposition
  • Surface activation
  • ­In-situ ion beam pre-cleaning in a static processing system
  • ­Direct deposition of thin films (e.g., DLC using hydrocarbon based gases)
  • ­Industrial, low maintenance design


Technical Specifications

Mean Ion Energy (eV)
100-1000
Ion Beam Density (mA/cm2)
0.2-3(Circular), 5-30(Linear)
Beam Uniformity (%) 15
Beam Divergence (in degree) 60
Discharge Voltage (V) 200-2000
Discharge Current (A) 0.1-1(Circular), 0.2-10(Linear 0.3m-5.0m)
Operating Pressure Range (mTorr) 0.8-50
Mounting Options Flange and Remote

Circular flange mount source:

        Can be designed according to the internal diameter of flange

 

Linear flange mount source:

Can be designed according to the required length from 0.3 meter to longer than 1.0 meter

 

 


Our circular ion source can be integrated into PVD cluster sputtering sources system to assist processes development.

             


Our linear ion source can also be integrated into industrial multiple sputtering sources system to conduct sample pre-cleaning and to enhance ionization of sputtered materials so as to improve film adhesion and quality for reactive deposition

         

  

 


Related Scientific Publications

D. L. Tang, S. H. Pu, X. M. Qiu, and P. K. Chu, Linear Ion Source with Magnetron Hollow Cathode Discharge, Review of Scientific Instruments, vol. 76, no. 11, pp. 113502-1 - 113502-4 (2005).

 

 

 

For additional product information and pricing contact our specialists at sales@plasmatechnol.com.

 

 

  Hits:1012  Input time:4/18/2017 【Print】 【Back
   
 
plasmatechnol.com
Sales Hotline: +852-98814818 Service Hotline: +852-69259880 E-mail: sales@plasmatechnol.com
Copyright©Plasma Technology Limited 1998-2017 All rights reserved